学术报告：X-ray Microscopy
题目：X-ray MicroscopyAbstract: We discuss recent progress in x-ray microscopy, covering an ever broadening range of applications. These include biological nanotomography, materials science, environmental sciences, cultural heritage, and industrial applications. Resolutions approach 10 nm with both soft and hard x-rays.
报告人：Prof. David Attwood, University of California, Berkeley
时 间：11月10日（周三）14：30
地 点：张江多功能报告厅
报告人简介：David Attwood received his Ph.D. in Applied Physics from New York University in 1972. He has been a Professor in Residence at UC Berkeley since 1989. He was co-founder of the Applied Science and Technology Ph.D. program and serves on its Executive Committee. He has been faculty advisor for the undergraduate Engineering Physics program for 15 years. His research interests center on the use of short wavelength electromagnetic radiation, soft x-rays and extreme ultraviolet radiation in the 1-50nm range. Applications of particular interest include element specific soft x-ray microscopy and EUV lithography. He and his students are also active in the use of novel Fourier optics, image contrast techniques, and the development and use of coherent sources at these short wavelengths. At the contiguous Lawrence Berkeley National Laboratory, he was the founding Director of the Center for X-Ray Optics (CXRO), and was first (1985-1988) Scientific Director of the Advanced Light Source (ALS). He is a Fellow Member of the American Physical Society and the Optical Society of America. He is author of Soft X-Rays and Extreme Ultraviolet Radiation: Principles and Applications, (Cambridge University Press, 2000). His lectures are regularly broadcast live over the Internet and electronically archived, such as at www.coe.berkeley.edu/AST/sxr2009 and www.coe.berkeley.edu/AST/srms. His personal webpage is at http://www.eecs.berkeley.edu/~attwood/
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